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XPS-ESCA

What is XPS / ESCA?

XPS (X-ray Photoelectron Spectroscopy)—also known as ESCA (Electron Spectroscopy for Chemical Analysis)—is a surface analysis technique that measures the elemental composition and chemical bonding states of the top ~1–10 nm of a material. XPS irradiates a sample with X-rays and detects emitted photoelectrons; the electron energies reveal which elements are present and their chemical states (e.g., oxidation state, bonding environment).

XPS/ESCA is widely used for surface contamination analysis, adhesion and coating studies, corrosion/oxidation evaluation, thin film chemistry, and process verification, especially where surface chemistry controls performance.

What XPS / ESCA Can Help You Solve

  • Surface contamination identification (organics, silicones, fluorinated residues, ionic species)

  • Chemical state analysis (oxidation states, bonding changes, functional groups indicators)

  • Adhesion / delamination investigations (weak boundary layers, surface treatments, residues)

  • Oxidation and corrosion studies (metal oxides/hydroxides, passivation quality)

  • Thin film and coating surface chemistry verification (treatments, primers, plasma effects)

  • Comparative studies (before/after cleaning, processing, aging, environmental exposure)

Typical Applications

  • Semiconductor & electronics: surface residues, plasma/clean effects, thin film chemistry checks

  • Metals & corrosion: oxide thickness trends (semi-quant), passivation/cleanliness verification

  • Polymers & adhesives: surface treatments (plasma/corona), additive migration, bonding failures

  • Coatings & paints: surface composition, contamination, weathering effects

  • Batteries & energy materials: surface films and chemistry changes (project-dependent)

  • Medical/industrial devices: surface cleanliness and treatment verification (project-dependent)

Capabilities & What You Receive

Core Measurements

  • Survey scan: elemental composition screening (atomic % for detected elements)

  • High-resolution scans: chemical state/bonding information for selected elements (e.g., C 1s, O 1s, N 1s, Si 2p, F 1s, metals)

  • Quantitative surface composition: atomic % within XPS sampling depth (semi-quantitative; sensitivity factors applied)

  • Angle-resolved XPS (optional): near-surface vs slightly deeper comparison (availability dependent)

  • Depth profiling (optional): sputter-assisted composition vs depth (destructive; project-dependent)

  • XPS mapping / imaging (optional): spatial distribution (project-dependent)

Deliverables

  • Survey spectrum and identified elements list

  • Atomic % table and interpretation notes

  • High-resolution spectra with peak fitting (when requested) and chemical state assignments

  • Optional: depth profile plots and/or maps

  • Clear conclusions and comparison summary (sample A vs B, before vs after)

Sample Requirements

  • Sample types: flat solids, films, coated coupons, metals, polymers, ceramics; small components possible if mountable

  • Surface condition: clean and dry; avoid fingerprints, tape residue, and dust

  • Size: typically small pieces fit the sample holder; flatness helps data quality

  • Vacuum compatibility: samples must be stable under high vacuum (provide SDS if needed)

  • Reference/control sample: strongly recommended for contamination and process comparison

  • Information to provide: target question (contamination? oxidation state? treatment verification?), expected materials, and any areas of interest

Workflow

  1. Requirement review (survey only vs high-res/fit; depth profile; mapping; acceptance criteria)

  2. Sample handling & mounting (clean handling procedures)

  3. Measurement (survey + targeted high-resolution scans; optional profiling/mapping)

  4. Data processing (element ID, quantification, peak fitting, chemical state interpretation)

  5. Comparison (defect vs non-defect, before vs after, sample A vs B)

  6. Report delivery (spectra + tables + conclusions + recommended next steps)

FAQs

XPS is surface sensitive, typically sampling the top ~1–10 nm depending on material and electron energies.

XPS cannot detect hydrogen. For thick films, XPS reports surface chemistry only; bulk composition may require FTIR, ICP, or combustion analysis depending on needs.

XPS provides semi-quantitative atomic % for the surface region. Absolute accuracy depends on matrix effects, surface roughness, and charging; it is excellent for comparison and trend analysis.

XPS excels at chemical states and quantitative surface composition. TOF-SIMS is more sensitive to molecular fragments and trace organics/ions and provides higher-resolution chemical imaging. They are often complementary.

Standard XPS is minimally destructive, though prolonged X-ray exposure can affect very sensitive polymers. Depth profiling is destructive in the analyzed area due to sputtering.

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