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RBS

What Is RBS (Rutherford Backscattering Spectrometry)?

RBS (Rutherford Backscattering Spectrometry) is an ion-beam analysis technique used to determine the composition and depth distribution of elements in solid materials—especially thin films and layered structures. In RBS, a high-energy ion beam (commonly He ions, MeV range) strikes the sample and some ions “backscatter” from atoms in the material. By measuring the energy of the backscattered ions, RBS can determine:

  • Which elements are present (heavier elements backscatter more strongly)

  • How much is present (areal density / thickness-related information)

  • How it changes with depth (near-surface to sub-surface depth profiles, sample-dependent)

Key advantages

  • Quantitative thin film composition + thickness (often without needing standards, project-dependent)

  • Strong for multi-layer stacks and interfaces

  • Non-destructive for many materials (the analyzed area is irradiated; beam effects are sample-dependent)

What RBS Is Used For

RBS is commonly used to evaluate:

  • Thin film thickness and areal density (single layers and stacks)

  • Elemental composition vs depth in layered coatings and diffusion layers

  • Interface quality (intermixing, diffusion, reaction layers—project-dependent)

  • Stoichiometry verification for films (e.g., metal oxides/nitrides—project-dependent)

  • Process comparisons (“what changed?”): before/after anneal, plasma, deposition changes

  • Contamination screening for heavier elements near the surface (project-dependent)

Why Use RBS (vs. Other Methods)?

RBS is selected when you need quantitative depth information in a film/stack with strong physical traceability.

Compared to XPS/TOF-SIMS

  • XPS/TOF-SIMS are extremely surface-sensitive and great for chemical states/trace residues, but quant depth interpretation can be complex.

  • RBS provides direct, physics-based depth profiling for elemental composition and thickness (best for heavier elements).

Compared to SEM-EDS

  • EDS is fast and localized but typically semi-quantitative and not inherently depth-resolved.

  • RBS can provide quantitative film areal density and depth distribution over the probed area.

Often paired methods

  • NRA/ERDA when hydrogen (or other light elements) are critical (project-dependent)

  • XRD for crystalline phase ID

  • XPS for chemical states / surface chemistry confirmation

Sample Types We Support

RBS is typically used for solid samples (project-dependent), such as:

  • Thin films and coatings: oxides, nitrides, metals, diffusion barriers (stack-dependent)

  • Semiconductor-related layers: film stacks on wafers/coupons (project-dependent)

  • Metals and alloys: surface treatments, oxidation layers, diffusion profiles

  • Ceramics and glass (project-dependent): layered structures or near-surface composition

  • Battery and energy materials (project-dependent): coating layers and near-surface elemental changes

Best practice: provide a reference/control (known-good) sample for comparison-based conclusions.

Typical Workflows

Film Thickness + Composition (Single Layer)

Best for: deposition verification, supplier qualification

  • Measure areal density / thickness (model-based)

  • Verify stoichiometry and major element ratios (project-dependent)

Multilayer Stack / Interface Evaluation

Best for: barrier stacks, reaction layers

  • Model multi-layer depth profiles

  • Identify interdiffusion/intermixing and interface shifts (project-dependent)

“Before / After” Process Study

Best for: anneal/plasma/aging comparisons

  • Run the same measurement plan on both conditions

  • Summarize deltas: thickness change, diffusion profile change, composition drift

What You Receive

Depending on scope and sample structure:

  • RBS spectra and fit/model overlays

  • Elemental depth profile (model-derived) and layer thickness/areal density results

  • Clear summary of:

    • What layers/elements are present

    • Thickness/stoichiometry findings

    • Key differences vs reference (if provided)

    • Recommended next steps if complementary methods are needed

Sample Submission Guidelines

Please provide

  • Substrate and film stack description (if known), target thickness range, and goal

  • Any process history (deposition method, anneal conditions, service exposure)

  • Target elements of interest and required accuracy

  • Reference/control sample whenever possible

  • Handling restrictions (ESD/cleanroom packaging, do-not-clean notes if surface is critical)

Packaging tips

  • Protect surfaces from fingerprints, dust, and rubbing (gloves + clean holders)

  • Label orientation and ROIs (photos help)

  • For wafers/coupons, use wafer carriers or rigid holders to prevent scratches

FAQs

RBS is generally not ideal for hydrogen and other very light elements. If hydrogen profiling is critical, we typically recommend NRA or ERDA (project-dependent).

Depth range depends on the material and beam energy. RBS is commonly used for thin films to near-surface/sub-surface profiling; exact depth capability is project-dependent.

It’s usually considered non-destructive for many inorganic solids, but the analyzed area is irradiated and some materials can be beam-sensitive. If your sample is sensitive, we’ll propose dose-minimized conditions (project-dependent).

Mass resolution has limits—elements close in mass can be harder to distinguish depending on matrix and energy resolution. In those cases, we may recommend complementary methods (project-dependent).

Strongly recommended for “what changed?” investigations—comparisons become faster and conclusions are more defensible.

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