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GD-MS & LA-ICP-MS

What Is GD-MS & LA-ICP-MS?

GD-MS (Glow Discharge Mass Spectrometry) and LA-ICP-MS (Laser Ablation–Inductively Coupled Plasma–Mass Spectrometry) are powerful techniques for multi-element trace analysis—especially when you need very low detection limits, broad elemental coverage, and strong materials insight.

  • GD-MS is primarily used for bulk and depth-resolved elemental analysis of solid, conductive (and some semi-conductive) materials. A glow discharge sputters atoms from the surface, which are then measured by mass spectrometry—making GD-MS highly effective for ultra-trace impurities and high-purity materials verification (sample-dependent).

  • LA-ICP-MS uses a focused laser to ablate microscopic amounts of material from a solid sample. The aerosol is carried into an ICP-MS for detection, enabling micro-area (localized) elemental analysis and elemental mapping—ideal for inclusions, particles, coatings, and heterogeneity investigations (project-dependent).

What These Methods Are Used For

Common goals

  • High-purity material qualification (supplier comparison, incoming QC, release support)

  • Trace contamination troubleshooting (unexpected metals causing corrosion, discoloration, catalyst poisoning, electrical leakage, etc.)

  • Process excursion investigations (tool wear, cross-contamination, carryover)

  • Failure analysis support (linking trace elements to defects, deposits, inclusions)

When to choose which

  • Choose GD-MS when you need bulk ultra-trace impurity levels in a solid and strong overall purity verification.

  • Choose LA-ICP-MS when you need spatial information: spot checks, line scans, maps, inclusions, or layered structures.

Why GD-MS / LA-ICP-MS (vs. Solution ICP-MS)?

Traditional solution ICP-MS requires digestion (acid prep), which can:

  • introduce contamination risk,

  • be slow for certain refractory materials,

  • lose spatial information.

GD-MS and LA-ICP-MS can reduce these limitations by:

  • analyzing solids directly (method-dependent),

  • enabling localized analysis (LA-ICP-MS),

  • supporting faster iteration for some investigations.

Sample Types We Support

GD-MS (sample-dependent)

  • High-purity metals and alloys (e.g., Al, Cu, Ni, Ti—project-dependent)

  • Sputtering targets and electronic materials (project-dependent)

  • Conductive ceramics or specialty solids (project-dependent)

LA-ICP-MS (project-dependent)

  • Metals, alloys, and specialty materials

  • Ceramics, glasses, minerals

  • Coatings and layered structures (thickness/feature dependent)

  • Polymers with fillers/inclusions (project-dependent)

  • Particles, inclusions, weld/HAZ regions, defect sites

  • Semiconductor and battery-related solids (project-dependent)

Best practice: include a reference/control sample (known-good lot) for side-by-side comparison.

Typical Workflows

Ultra-Trace Purity Verification (GD-MS)

Best for: supplier qualification, high-purity specifications

  • Multi-element impurity panel

  • Lot-to-lot comparison and trend summary

  • Pass/fail reporting vs your limits (if provided)

Localized Contamination Hunt (LA-ICP-MS)

Best for: inclusions, defects, “where is it coming from?”

  • Targeted spot analysis on ROI (region of interest)

  • Optional line scans or maps (project-dependent)

  • Correlate with microscopy (e.g., SEM-EDS) when useful

Root Cause Package (GD-MS + LA-ICP-MS)

Best for: high-impact excursions

  • Bulk purity check (GD-MS) + localized confirmation (LA-ICP-MS)

  • Clear separation of bulk background vs localized contaminant hotspots

  • Actionable conclusion and next-step verification plan

What You Receive

  • Multi-element results table with units and reporting limits (method-dependent)

  • Measurement notes: calibration/QC approach, sample prep/handling summary

  • Comparison summary (reference vs suspect), including key deltas and likely significance

  • For LA-ICP-MS projects: spot list, ROI images, and optional maps/line scans (scope-dependent)

  • Clear conclusions: what’s present, what changed, likely source pathways, and next steps

Sample Submission Guidelines

Please provide

  • Material type, form (coupon/target/pellet/part), and application context

  • The question: purity verification, contamination source, mapping, or comparison

  • Any required spec limits and target elements (if applicable)

  • Lot/batch IDs and process history (tool changes, suppliers, handling, cleaning steps)

  • A reference/control sample whenever possible

Typical sample amounts

  • GD-MS: solid coupons/targets sized for mounting (dimensions project-dependent)

  • LA-ICP-MS: small coupons/sections; for mapping, provide enough area for multiple ROIs

Packaging tips

  • Use clean containers and gloves; avoid metal-to-metal rubbing

  • Label orientation and ROI; include photos if defects/inclusions are localized

  • If ultra-trace is critical, use cleanroom-style packaging where possible (project-dependent)

FAQs

Often yes, but achievable limits depend on the matrix, elements, and measurement plan. Share your required limits and material type for method selection.

They cover a very wide range, but not every element is equally accessible in every matrix. We’ll confirm the best panel for your material and goals.

Yes (project-dependent). Mapping feasibility depends on feature size, required resolution, and surface condition.

If the requirement is bulk purity, GD-MS is often the best fit. If you suspect localized contamination or inclusions, LA-ICP-MS adds crucial spatial evidence.

Have additional questions?
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