logo

XPS-ESCA

What is XPS / ESCA?

XPS (X-ray Photoelectron Spectroscopy)—also known as ESCA (Electron Spectroscopy for Chemical Analysis)—is a surface analysis technique that measures the elemental composition and chemical bonding states of the top ~1–10 nm of a material. XPS irradiates a sample with X-rays and detects emitted photoelectrons; the electron energies reveal which elements are present and their chemical states (e.g., oxidation state, bonding environment).

XPS/ESCA is widely used for surface contamination analysis, adhesion and coating studies, corrosion/oxidation evaluation, thin film chemistry, and process verification, especially where surface chemistry controls performance.

What XPS / ESCA Can Help You Solve

  • Surface contamination identification (organics, silicones, fluorinated residues, ionic species)

  • Chemical state analysis (oxidation states, bonding changes, functional groups indicators)

  • Adhesion / delamination investigations (weak boundary layers, surface treatments, residues)

  • Oxidation and corrosion studies (metal oxides/hydroxides, passivation quality)

  • Thin film and coating surface chemistry verification (treatments, primers, plasma effects)

  • Comparative studies (before/after cleaning, processing, aging, environmental exposure)

Typical Applications

  • Semiconductor & electronics: surface residues, plasma/clean effects, thin film chemistry checks

  • Metals & corrosion: oxide thickness trends (semi-quant), passivation/cleanliness verification

  • Polymers & adhesives: surface treatments (plasma/corona), additive migration, bonding failures

  • Coatings & paints: surface composition, contamination, weathering effects

  • Batteries & energy materials: surface films and chemistry changes (project-dependent)

  • Medical/industrial devices: surface cleanliness and treatment verification (project-dependent)

Capabilities & What You Receive

Core Measurements

  • Survey scan: elemental composition screening (atomic % for detected elements)

  • High-resolution scans: chemical state/bonding information for selected elements (e.g., C 1s, O 1s, N 1s, Si 2p, F 1s, metals)

  • Quantitative surface composition: atomic % within XPS sampling depth (semi-quantitative; sensitivity factors applied)

  • Angle-resolved XPS (optional): near-surface vs slightly deeper comparison (availability dependent)

  • Depth profiling (optional): sputter-assisted composition vs depth (destructive; project-dependent)

  • XPS mapping / imaging (optional): spatial distribution (project-dependent)

Deliverables

  • Survey spectrum and identified elements list

  • Atomic % table and interpretation notes

  • High-resolution spectra with peak fitting (when requested) and chemical state assignments

  • Optional: depth profile plots and/or maps

  • Clear conclusions and comparison summary (sample A vs B, before vs after)

Sample Requirements

  • Sample types: flat solids, films, coated coupons, metals, polymers, ceramics; small components possible if mountable

  • Surface condition: clean and dry; avoid fingerprints, tape residue, and dust

  • Size: typically small pieces fit the sample holder; flatness helps data quality

  • Vacuum compatibility: samples must be stable under high vacuum (provide SDS if needed)

  • Reference/control sample: strongly recommended for contamination and process comparison

  • Information to provide: target question (contamination? oxidation state? treatment verification?), expected materials, and any areas of interest

Workflow

  1. Requirement review (survey only vs high-res/fit; depth profile; mapping; acceptance criteria)

  2. Sample handling & mounting (clean handling procedures)

  3. Measurement (survey + targeted high-resolution scans; optional profiling/mapping)

  4. Data processing (element ID, quantification, peak fitting, chemical state interpretation)

  5. Comparison (defect vs non-defect, before vs after, sample A vs B)

  6. Report delivery (spectra + tables + conclusions + recommended next steps)

FAQs

XPS is surface sensitive, typically sampling the top ~1–10 nm depending on material and electron energies.

XPS cannot detect hydrogen. For thick films, XPS reports surface chemistry only; bulk composition may require FTIR, ICP, or combustion analysis depending on needs.

XPS provides semi-quantitative atomic % for the surface region. Absolute accuracy depends on matrix effects, surface roughness, and charging; it is excellent for comparison and trend analysis.

XPS excels at chemical states and quantitative surface composition. TOF-SIMS is more sensitive to molecular fragments and trace organics/ions and provides higher-resolution chemical imaging. They are often complementary.

Standard XPS is minimally destructive, though prolonged X-ray exposure can affect very sensitive polymers. Depth profiling is destructive in the analyzed area due to sputtering.

Have additional questions?
OR
Contact Us

For general inquiries, please fill out the form below and we will have someone from our team contact you as soon as possible.